General information

• Investigation area

  Other
• Techniques

  Nanopatterning and Lithography
  
• Manufacturer

  Raith
• Fabrication year

  2014
• Main application

  FIB-SEM nanolithography and nanopatterning, SEM lithography, (3D) rapid nano prototyping

Instrument specification

• Technical aspects

  RAITH ELPHY MultiBeam
  20 MHz - Nanopattering  (Nanolithography & Nanofabrication)

  400 MHz Digital Signal Processor
  50 ns minimum dwell time with 1 GHz resolution
  Thermally stabilized 16 bit DA converters
  Multi I/O Signal Router
  ELPHY NanoSuite software

  (installed at Auriga 40 from Zeiss - FIBSEM -: for Nanopattering processing, the SEM has been extended to include ELPHY MultiBeam)

Contact

• Application scientist

  Reiner Klattenhoff
  , BIAS
  FZB / HB 1080
  Phone number 421 218 58073
  klattenhoffprotect me ?!biasprotect me ?!.de
• Eva-Maria Meyer
  Fachbereich 1
  NW1 / O 01120
  Phone number 421 218 62617
  emeyerprotect me ?!imsas.uni-bremenprotect me ?!.de
• Principal investigator

  Bergmann, Ralf
  Björn Lüssem
  

Instrument location

• Building

  NW1
• Room

  O0080
• Faculty

  Fachbereich 1
• Institute University

  IMSAS