General information

• Investigation area

  Electron Microscopy
• Techniques

  Scanning Electron Microscopy
  
• Manufacturer

  Zeiss
• Fabrication year

  2013
• Measured quantity

  layer thickness; surface morphology
• Main application

  Thickness measurement, material deposition, ion beam etching, e-beam lithography

Instrument specification

• Technical aspects

  Canion FIB column

  Gallium ion source with a long service life of 1500 µAh
  Optimum lateral resolution < 7.0 nm at 30 KV, energy range 1 kV - 30 kV
  Beam current 1 pA - 50 nA, selectable via high-precision motorised aperture changer

  (installed at Auriga 40 from Zeiss - FIBSEM -: for fine processing, the SEM has been extended to include an FIB, in which samples made of polymer, semiconductor material or metal can be structured with micrometre precision using a gallium ion beam.)
   

Contact

• Application scientist

  Reiner Klattenhoff
  , BIAS
  FZB / HB 1080
  Phone number 421 218 58073
  klattenhoffprotect me ?!biasprotect me ?!.de
• Eva-Maria Meyer
  Fachbereich 1
  NW1 / O 01120
  Phone number 421 218 62617
  emeyerprotect me ?!imsas.uni-bremenprotect me ?!.de
• Principal investigator

  Bergmann, Ralf
  Björn Lüssem
  

Instrument location

• Building

  NW1
• Room

  O0080
• Faculty

  Fachbereich 1
• Institute University

  IMSAS