General information

• Investigation area

  Surface Analytics
• Techniques

  3D Laser Lithography
  
• Manufacturer

  Nanoscribe
• Fabrication year

  2010
• Main application

  Fabrication of 3D polymer-based structures like waveguides, DOE's, or photonic crystals.

Instrument specification

• Technical aspects

  Lateral feature size: < 200 nm (lateral linewidth in IP-L 780)

  Lateral resolution: < 500 nm

  Axial resolution: 800 nm

  Piezo range: 300 µm x 300 µm x 300 µm

  Laser center wavelength: 780 nm

• Additional measurement possibilities

  3D laser lithography, direct laser writing, two-photon polymerization, polymers, DOE, material manipulation, structure fabrication, surface modification, 3D design

Contact

• Application scientist

  Claas Falldorf
  , BIAS
  OMOS: Coherent Optics and Nanophotonics FZB / HB 2540
  Phone number 421 218 58013
  falldorfprotect me ?!biasprotect me ?!.de
• Principal investigator

  Bergmann, Ralf
  

Instrument location

• Group

  OMOS: Coherent Optics and Nanophotonics
• Building

  LION
• Room

  0.230
• Institute

  BIAS