General information

• Investigation area

  Other
• Techniques

  Atomic Layer Deposition
  
• Manufacturer

  Oxford Instruments
• Fabrication year

  2021
• Main application

  Material deposition

Instrument specification

• Technical aspects

  Atomic layer deposition (ALD) is a material growth method. The system is capable of growing oxides (Ga2O3, Al2O3, TiO2), sulfides (MoS2, WS2) and nitrides (AlN, TaN). It is equipped with a remote plasma sourse for oxygen- and nitrogen plasma, an ozone generator as well as a water vcapor source for oxygen.

• Additional measurement possibilities

  The system is attached to an XPS/UPS system and an MBE-system via UHV transfer line.

Contact

• Application scientist

  Tessarek, Christian
  Fachbereich 1
  NW1 M4090 Institut für Festkörperphysik
  Phone number 0421 218 62223
  tessarekprotect me ?!uni-bremenprotect me ?!.de
• Principal investigator

  Eickhoff, Martin
  

Instrument location

• Group

  AG Festkörpermaterialien
• Building

  NW1
• Faculty

  Fachbereich 1
• Institute University

  IFP