General information

• Investigation area

  Electron Microscopy
• Techniques

  Scanning Electron Microscopy
  
• Manufacturer

  Zeiss
• Fabrication year

  2012
• Measured quantity

  Dimensions, surface morphology, composition
• Main application

  Microscopy with up to nm resolution, material characterization
• Correlated workflow available

  Yes

Instrument specification

• Technical aspects

  Auriga 40 from Zeiss - FIBSEM - with energy dispersive X-ray spectroscopy (EDS) from Oxford - X-max 150, In-lens-detector for high resolution, energy selective backscatter electron (EsB)-detector for low kV-range, charge compensation (CC), backscatter detector for high kV range

  holders for 4 and 6 inch wafers, 9-stub-holder for 12,5 mm diameter pin stubs, holder for one dove tail stub

• Correlated workflow

  X-ray microscopy (XRM)
• Additional measurement possibilities

  Lift-out system for TEM lamella preparation

Contact

• Application scientist

  Eva-Maria Meyer
  Fachbereich 1
  NW1 / O 01120
  Phone number 421 218 62617
  emeyerprotect me ?!imsas.uni-bremenprotect me ?!.de
• Principal investigator

  Björn Lüssem
  

Instrument location

• Building

  NW1
• Room

  O0080
• Faculty

  Fachbereich 1
• Institute University

  IMSAS